Optimization Of Electrophoretic Deposition Parameters For Uniform Zinc Oxide Deposition On Conductive Glass Substrate And Comparative Analysis With Titanium Oxide

Abstract

This investigation is about the Electrophoretic Deposition (EPD) of ZnO nanoparticles on the substrate of fluorine-doped tin oxide (FTO). It is always being a challenge to get a well-developed deposition. This study shows that smoother deposition can be achieved by controlling the deposition voltages, deposition time and deposition distance. The EPD processing is conducted via cathodic electrodeposition to get a uniform crack-free, smooth deposition of Zinc Oxide which is important to develop various electronics device applications. The work focuses on finding out the optimum condition for crack free deposition by these three parameters mentioned above. From the observation it is seen that the amount of deposition increase when deposition time and voltage increase. On the other hand, increasing the deposition distance, amount of the deposition decreases. By observing all the data, deposition voltage, deposition time and deposition distance are 60 V, 60 s and 1.2 cm respectively produces crack-free deposition of ZnO and these are the parameters that has been proposed as an optimized deposition condition for the deposition of ZnO nanoparticles. Another comparative investigation between ZnO and TiO2 shows, though the amount of the deposition of ZnO is low but ZnO produces smoother crack-free deposition than TiO2.